Reactive Ion Etching (RIE)

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Responsibility:

RIE 80:   

  1. pending

RIE 76:   


Ractive Ion Etching RIE80

RIE 80 Insulators (Oxford Instruments RIE 80 Plus)

  • Plasma etching of dielectric layers and photoresists
  • Sample size up to 6”
  • Base pressure < 10x10-6 mbar
  • RF 13.56 MHz (500W) generator
  • CHF3, CF4, SF6, O2, Ar, N2 gas
Reactive Ion Etching RIE76

RIE 76 (Oxford Instruments RIE 80 Plus)

  • Plasma etching of metals, polymers, and other materials
  • Sample size up to 6”
  • Base pressure <10x10-5 mbar
  • RF 13.56 MHz (300W) generator
  • SF6, CF4, CHF3, Ar, O2, N2 gas lines
 
 
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Fri Jul 21 01:46:57 CEST 2017
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