Molecular Beam Epitaxy (MBE)

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Molecular Beam Epitaxy (MBE)
MBE is a a thin film crystal growth technique.
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Veeco Gen III MBE System for Arsenides (As MBE)

Arsenic MBE

Responsibility:

Processes:

  • Standard arsenide epitaxial growth of binary and ternary semiconductor materials AlxGa1-xAs and InxGa1-xAs
  • Only GaAs substrates are allowed in the growth chamber
  • Doping sources: Si, CBr4
  • Growth of thick structures is possible, e.g. DBRs and VECSEL devices
  • Process control with RHEED, BandiT and RGA

Veeco Gen III MBE System for Phosphides, Antimonides and Arsenides (P MBE)

Responsibility:

Phosphorus Molekular Beam Epitaxy

Processes:

  • Exploratory system for a variety of binary to quinary III-V compound semiconductors
  • No silicon or sapphire subtrates are allowed
  • Sources: As, P, Sb, Ga, In, Al
  • Doping source:  Si
  • Growth of thick structures is limited to the use of P-, Sb- or As-containing materials only
  • Process control with RHEED, BandiT, optical pyrometer and RGA

VG VH80 MBE System

VG MBE

Responsibility:

Processes:

  • Epitaxial growth of unipolar III-V compounds on InP and GaAs substrates
  • Growth chamber equipped with 10 cell ports
  • Sources: As, Ga, Al, In, Si (dopant)
  • Process control: RHEED, optical pyrometer

Preparation chamber

Responsibility:

  1.  
  2.  
UHV preparation chamber
  • Atomic hydrogen cleaning of substrate surfaces as elevated temperatures
  • Process control with RHEED and RGA
  • Effusion and cracker cell baking and storage

Optical Temperature Measurement

BandiT

Substrate temperature monitoring using BandiT (band-edge thermometry).

Responsibility:

BandiT As-MBE

BandiT P-MBE

Pyrometer

Optical temperature measurement of substrate surfaces.

Responsibility:


UHV Wet Bench

Wet bench for cleaning and etching of UHV (Ultra High Vacuum) parts (MBE parts only)

Responsibility:



UHV Work Bench

Work bench for cleaning and working on UHV (Ultra High Vacuum) parts (MBE parts only)

Responsibility:

Flow Box for UHV Preparation

Flow box for preparing holders and wafers (MBE only)

Responsibility:

Dry Oven

Circulating air oven for drying UHV (Ultra High Vaccum) parts (MBE only)

Responsibility:

 
 
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Fri Jul 21 01:48:05 CEST 2017
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