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Mask Aligners Photolithography
Photolitography room with special yellow lighting in order to avoid exposure of photosensitive surfaces.
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Karl Süss mask aligner MA6

Responsibility:

Mask aligner MA6
  • Manual mask aligner for samples > 5 x 5 mm2, Max Size 4"
  • 350 W Hg light source
  • Broadband light source 400 nm (350-450nm)
  • Resolution 500 nm
  • Accuracy 100 nm
  • Split field alignment

Karl Süss mask aligner MJB3

Responsibility:

Mask Aligner MJB3
  • Manual mask aligner for samples >= 4x4 mm2, max. Size 3"
  • 350 W Hg light source
  • Broadband light source 400 nm (350-450nm)
  • Resolution 500 nm
  • Accuracy 100 nm
  • Option for backside alignment with IR camera

ABM deep UV mask aligner

Deep UV mask aligner
  • Manual mask aligner for UV/DUV lithography
  • 1000 W Hg light source
  • 220nm, 254nm, 365/405 nm wavelength
  • Resolution ~300 nm
  • Accuracy 100 nm
  • Split field alignment
  • Max. 2” wafer size

LOT-Oriel 500W Hg UV-Source

Responsibility:


Ultraviolett lamp
  • Large aperture high power UV light-source
  • 5000 W Hg light source
  • 253, 302, 312, 365 and 405 nm wavelength
  • 150 mW/cm2 intensity
  • 4" diameter
 
 
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Thu Jul 20 01:57:17 CEST 2017
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