Scanning Electron Microscope

Zeiss ULTRA 55

• Digital Field Emission Scanning Electron Microscope
• 0.1-30 keV beam energy
• 1 - 1.7 nm resolution
• ZEISS Complete Detection System with ET, Inlens SE, EsB and AsB detectors
• Sample holders for chips, 2” and 4” substrates
• all 5 axes full motorized
• TIFF, BMP and JPG image up to 3072 x 2304 pixel resolution

Room: HCI B129.7 SEM
Tel: -34626

Responsible persons for user training and technical support:

(1) Diego Marti
(2) Sandro Bellini

Zeiss ULTRA plus with integrated charge compensation

• Digital Field Emission Scanning Electron Microscope
• 0.02 - 30 keV beam energy
• 1.7 nm resolution
• ZEISS detection system with Inlens SE, EsB and SE detectors
• Sample holders for chips, 2” and 4” substrates
• all 5 axes full motorized
• TIFF, BMP and JPG image up to 3072 x 2304 pixel resolution
• AVI – Image capture software for recording of audiovisual interleaves
• Charge compensation: For isolating materials: resist, sapphire, glass, capton etc.
• OptiProbe: Software system to adjust the probe current continuously.

Room: HCI B129.7 SEM
Tel: -34626

Responsible persons for user training and technical support:

(1) Sandro Bellini
(2) Diego Marti

 

SEM Manual, PDF, NETHZ-Login required

Sputter system Pt (BAL-TEC SCD-050)

• Sputter coating of non-conductive SEM samples with Pt
• Ar plasma
• Platinum target
• Samples up to 2” diameter

Room: HCI B129.7 SEM
Tel: -34626

Responsible persons for user training and technical support:
(1) Valentin Döring
(2) Julian Schneider