Physical Vapor Deposition Systems

Evaporation Univex 500

• Electron beam evaporation of metals
  10 keV electron beam energy, 6 kW power
• Sample size up to 2“
• 6 x 7 cm³ pockets, 4 cm³ C or Mo liners
• Dielectrics: (SiO₂, Al₂O₃, ITO,...)
• Metals: (Au, Ti, Al,...)
• Semiconductors: (Si, Ge)
• 6 MHz double X-tal monitor
• Ar sputter ion source

Room: HCI B129.1 Deposition
Tel: -34657

Responsible persons for user training and technical support:
(1) Reto Giannini
(2) Sabine Riedi

Univex 500 Manual, PDF, NETHZ-Login required

Evaporation Plassys II

• Electron beam evaporation of metals
• 10keV electron beam energy, 10kW power
• Ti, Pt, Au, Cr, Ni, Ge, Ta(optional), Cu(optional), Pd(optional), W(Optional)
• Sample size up to 4", 3 times 2"
• 8cm³ pockets
• Tiltable sampleholder
• O₂, Ar/O₂ oxidation line
• 6 MHz X-tal monitor(three crystals)
• Ar sputter ion source

Room: HCI B129.1 Deposition

Responsible persons for user training and technical support:
(1) Alfredo Bismuto
(2) Stefano Tirelli
(3) Markus Geiser

Plassys II Manual, PDF, NETHZ-Login required

Evaporation Plassys MEB550S

• Electron beam evaporation of metals
• 10keV electron beam energy, 10kW power
• Sample size up to 4"
• 12cm³ pockets
• Al, Ti, Au
• Tiltable sampleholder
• O₂, Ar/O₂ oxidation line
• 6 MHz X-tal monitor
• Ar sputter ion source

Room: HCI B129.1 Deposition

Responsible persons for user training and technical support:
(1) Matthias Baur
(2) Lars Steffen