FIRST - Frontiers In Research: Space & Time

Inductively Coupled Plasma Etching

Other scientific service centers at ETH:


20.08.2015 FIRST User Introduction Day

Lecture Announcement:

Semiconductor Materials: Characterization, Processing & Devices

Spring Semester Tuesdays, 11:45 a.m., HCI F8

Oxford Instruments ICP 180

The ICP system is mainly dedicated for anisotropic etching of InP, GaAs and its quaternary materials. It is equipped with the neccessary gas sources to run the common standard reciepes for these compound semiconductors. The coil around the chamber allows to couple inductively energy to the plasma, allowing a more dense plasma.



Room: HCI B129.1 Deposition
Tel: -34657

Responsible persons for user training and technical support:
(1) Ralf Flückiger
(2) Angel Pallin


Short Workinstruction, PDF, NETHZ-Login required

Workinstruction, PDF, NETHZ-Login required


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