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Inductively Coupled Plasma Etching

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News:

22.05.2014 FIRST User Introduction Day

Lecture Announcement:

Semiconductor Materials: Characterization, Processing & Devices

Spring Semester Tuesdays, 11:45 a.m., HCI F8

Oxford Instruments ICP 180

The ICP system is mainly dedicated for anisotropic etching of InP, GaAs and its quaternary materials. It is equipped with the neccessary gas sources to run the common standard reciepes for these compound semiconductors. The coil around the chamber allows to couple inductively energy to the plasma, allowing a more dense plasma.

Projects

Reservation:
ICP

Room: HCI B129.1 Deposition
Tel: -34657

Responsible persons for user training and technical support:
(1) Ralf Flückiger
(2) Angel Pallin

 


Short Workinstruction, PDF, NETHZ-Login required

Workinstruction, PDF, NETHZ-Login required

 

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